HomeTrade ShowsUSASPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026
USAMonterey, CAVerified Exhibitiononce a year
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SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026

Event DatesSept. 08 - 11, 2026Duration: 4 days
City & CountryMonterey, CA, USA
Designated VenueMonterey Conference Center
Target AudienceTrade Public
Official Event Website

About the Exhibition

Photo Mask Technology Exhibition. SPIE Photomask Technology + Extreme Ultraviolet Lithography is a highly regarded exhibition & conference for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry

Classified Sectors:
Electronic Design & ComponentsOptoelectronicsMicro & NanotechnologiesSciences for Engineers - Research & Development
Exhibitor IntelligenceTriple Verified

Confirmed Exhibitor Intelligence Roster

Preview of confirmed exhibiting brands requiring stand construction, AV, and event marketing for SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026.

Exhibiting CompanyOriginRegistered SpaceDecision-Maker Contact
NovaCloud Enterprise Systems
United States
140 sqm Interactive Island
Chief Marketing Officer (CMO) (Protected)
CyberShield Infrastructure Group
Israel
85 sqm Modular Stand
Director of Global Field Marketing (Protected)
USA Data Solutions Corp
USA
100 sqm Island Booth
Head of Global Events (Protected)

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Venue & Logistics

Monterey Conference Center

One Portola Plaza, Monterey, CA 93940

Official Organizer

SPIE (International Society for Optical Engineering)

PO Box 10, 1000 20th St., Bellingham, WA 98225-6705, USA

Official Event Desk

Stand Contractor Advantage
  • 6–10 months advance notice
  • Decision-maker direct reach
  • 100% verified deliverable emails
Event Dossier Insights

Frequently Asked Questions About SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026

Key logistics and contractor intelligence guidelines for this trade fair.

SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026 is scheduled from Sept. 08 - 11, 2026 to 2026-09-11 in Monterey, CA, USA.
SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 20262026-09-08 • Monterey, CA, USA